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TWO STEP TRANSPARENT CONDUCTIVE FILM DEPOSITION METHOD AND GAN NANOWIRE DEVICES MADE BY THE METHOD
TWO STEP TRANSPARENT CONDUCTIVE FILM DEPOSITION METHOD AND GAN NANOWIRE DEVICES MADE BY THE METHOD
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机译:两步透明导电膜沉积方法及由该方法制得的甘南威设备
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摘要
A method of making a semiconductor device includes depositing a first transparent conductive film (TCF) contact layer on a sidewall of a III-nitride semiconductor nanostructure by evaporation, and depositing a second TCF contact layer over the first TCF contact layer by sputtering or chemical vapor deposition (CVD).
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