TWO STEP TRANSPARENT CONDUCTIVE FILM DEPOSITION METHOD AND GAN NANOWIRE DEVICES MADE BY THE METHOD

摘要

A method of making a semiconductor device includes depositing a first transparent conductive film (TCF) contact layer on a sidewall of a III-nitride semiconductor nanostructure by evaporation, and depositing a second TCF contact layer over the first TCF contact layer by sputtering or chemical vapor deposition (CVD).