首页> 外国专利> OSTOMY APPLIANCE WAFER HAVING AN ABSORBENT LAYER LOCATED BETWEEN A FIRST ADHESIVE AND A SECOND ADHESIVE

OSTOMY APPLIANCE WAFER HAVING AN ABSORBENT LAYER LOCATED BETWEEN A FIRST ADHESIVE AND A SECOND ADHESIVE

机译:渗透压器具在第一和第二粘合剂之间有一层吸收层

摘要

An ostomy appliance wafer is provided with a stoma-receiving hole formed through the wafer. The wafer includes a backing layer, and an absorbent layer located between a first adhesive and a second adhesive. The first adhesive is disposed over the backing layer to define a peripheral edge area, a central area surrounding the hole, and an intermediate area of the wafer that is located between the peripheral edge area and the central area. The absorbent layer is disposed on the first adhesive either in A) the central area of the wafer, B) the intermediate area of the wafer, or C) the central area and the intermediate area of the wafer. The second adhesive is disposed over both a portion of an outer edge area of the absorbent layer and a portion of the first adhesive peripheral to the outer edge area of the absorbent layer.
机译:造口术器具晶片具有穿过晶片形成的造口容纳孔。晶片包括背衬层和位于第一粘合剂和第二粘合剂之间的吸收层。第一粘合剂设置在背衬层上以限定外围边缘区域,围绕孔的中心区域以及位于外围边缘区域和中心区域之间的晶片的中间区域。吸收层在A)晶片的中心区域,B)晶片的中间区域或C)晶片的中心区域和中间区域中设置在第一粘合剂上。第二粘合剂布置在吸收层的外边缘区域的一部分和第一粘合剂的在吸收层的外边缘区域周围的一部分上。

著录项

  • 公开/公告号US2016158057A1

    专利类型

  • 公开/公告日2016-06-09

    原文格式PDF

  • 申请/专利权人 COLOPLAST A/S;

    申请/专利号US201615042154

  • 发明设计人 PETER KWOK HING LAM;

    申请日2016-02-12

  • 分类号A61F5/443;A61L24/06;A61L24/04;

  • 国家 US

  • 入库时间 2022-08-21 14:34:03

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