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Semiconductor Device with Trench Gate Structure Including a Gate Electrode and a Contact Structure for a Diode Region

机译:具有沟槽栅结构的半导体器件,该沟槽栅结构包括用于二极管区的栅电极和接触结构

摘要

A semiconductor device includes trench structures that extend from a first surface into a semiconductor body. The trench structures include a gate structure and a contact structure that extends through the gate structure, respectively. Transistor mesas are between the trench structures. Each transistor mesa includes a body zone forming a first pn junction with a drift structure and a second pn junction with a source zone. Diode regions directly adjoin one of the contact structures form a third pn junction with the drift structure, respectively.
机译:半导体器件包括从第一表面延伸到半导体主体中的沟槽结构。沟槽结构分别包括栅极结构和延伸通过栅极结构的接触结构。晶体管台面位于沟槽结构之间。每个晶体管台面包括形成具有漂移结构的第一pn结和具有源极区域的第二pn结的主体区。二极管区直接邻接接触结构之一,分别与漂移结构形成第三pn结。

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