首页> 外国专利> Termination design by metal strapping guard ring trenches shorted to a body region to shrink termination area

Termination design by metal strapping guard ring trenches shorted to a body region to shrink termination area

机译:通过金属捆扎式保护环沟槽缩短到主体区域的端接设计,以缩小端接面积

摘要

This invention discloses a semiconductor power device formed in a semiconductor substrate of a first conductivity type comprises an active cell area and a termination area surrounding the active cell area and disposed near edges of the semiconductor substrate. The termination area includes a plurality of trenches filled with a conductivity material forming a shield electrode and insulated by a dielectric layer along trench sidewalls and trench bottom surface wherein the trenches extending vertically through a body region of a second conductivity type near a top surface of the semiconductor substrate and further extending through a surface shield region of the first conductivity type. A dopant region of the second conductivity type disposed below the surface shield region extending across and surrounding a trench bottom portion of the trenches. At least a metal connector disposed above the top surface of the semiconductor substrates electrically connecting to the shield electrode of at least two trenches and shorted to the body region.
机译:本发明公开了一种形成在第一导电类型的半导体衬底中的半导体功率器件,其包括有源单元区域和围绕有源单元区域并设置在半导体衬底的边缘附近的终端区域。终端区包括多个沟槽,这些沟槽填充有导电材料,形成屏蔽电极,并由电介质层沿沟槽侧壁和沟槽底表面绝缘,其中,沟槽垂直延伸通过第二导电类型的主体区域,靠近第二导体的顶表面。半导体衬底,并进一步延伸穿过第一导电类型的表面屏蔽区域。第二导电类型的掺杂剂区域设置在表面屏蔽区域的下方,该表面屏蔽区域跨过沟槽的沟槽底部延伸并围绕沟槽的沟槽底部。至少一个金属连接器设置在半导体衬底的顶表面上方,该金属连接器电连接到至少两个沟槽的屏蔽电极并且短路到主体区域。

著录项

  • 公开/公告号US9397154B2

    专利类型

  • 公开/公告日2016-07-19

    原文格式PDF

  • 申请/专利权人 ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED;

    申请/专利号US201514841687

  • 发明设计人 KARTHIK PADMANABHAN;MADHUR BOBDE;

    申请日2015-08-31

  • 分类号H01L29/00;H01L29/06;H01L29/78;H01L29/40;H01L29/10;H01L29/08;

  • 国家 US

  • 入库时间 2022-08-21 14:31:31

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