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Semiconductor device comprising a second organic film over a third insulating film wherein the second organic film overlaps with a channel formation region and a second conductive film

机译:半导体器件,包括在第三绝缘膜上的第二有机膜,其中第二有机膜与沟道形成区重叠以及第二导电膜

摘要

In an active matrix type liquid crystal display device, in which functional circuits such as a shift register circuit and a buffer circuit are incorporated on the same substrate, an optimal TFT structure is provided along with the aperture ratio of a pixel matrix circuit is increased. There is a structure in which an n-channel TFT, with a third impurity region which overlaps a gate electrode, is formed in a buffer circuit, etc., and an n-channel TFT, in which a fourth impurity region which does not overlap the gate electrode, is formed in a pixel matrix circuit. A storage capacitor formed in the pixel matrix circuit is formed by a light shielding film, a dielectric film formed on the light shielding film, and a pixel electrode. Al is especially used in the light shielding film, and the dielectric film is formed anodic oxidation process, using an Al oxide film.
机译:在将诸如移位寄存器电路和缓冲电路的功能电路结合在同一基板上的有源矩阵型液晶显示装置中,随着像素矩阵电路的开口率的增加,提供了最佳的TFT结构。有这样的结构,其中在缓冲电路等中形成具有与栅电极重叠的第三杂质区域的n沟道TFT,以及其中不重叠的第四杂质区域的n沟道TFT。栅电极形成在像素矩阵电路中。形成在像素矩阵电路中的存储电容器由遮光膜,形成在遮光膜上的电介质膜和像素电极形成。 Al特别用于遮光膜,并且介电膜使用Al氧化膜形成阳极氧化工艺。

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