METHOD OF MANUFACTURING MASK BLANK WITH RESIST FILM, METHOD OF MANUFACTURING TRANSFER MASK, MASK BLANK WITH RESIST FILM, METHOD OF MANUFACTURING MASK BLANK, AND MASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide technology for improving in-plane uniformity of a pattern.;SOLUTION: A method for manufacturing a mask blank 1 with a resist film is provided, which includes: a substrate preparation step of preparing a substrate 10 having a thin film 11; a resist film formation step of forming a resist film 12 on a surface of the thin film 11; and a removal step of removing a peripheral part of the resist film 12. In the removal step, the peripheral part of the resist film 12 is removed in such a manner that directivity of the substrate 10 in a plan view when the substrate is horizontally mounted is imparted by a positional relationship in a plan view between the thin film 11 and the resist film 12.;COPYRIGHT: (C)2016,JPO&INPIT