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IGBT STRUCTURE FOR WIDE BAND-GAP SEMICONDUCTOR MATERIALS

机译:宽禁带半导体材料的IGBT结构

摘要

An IGBT device includes an IGBT stack, a collector contact, a gate contact, and an emitter contact. The IGBT stack includes an injector region, a drift region over the injector region, a spreading region over the drift region, and a pair of junction implants in the spreading region. The spreading region provides a first surface of the IGBT stack, which is opposite the drift region. The pair of junction implants is separated by a channel, and extends from the first surface of the IGBT stack along a lateral edge of the IGBT stack towards the drift region to a first depth, such that the thickness of the spreading region is at least one and a half times greater than the first depth.
机译:IGBT器件包括IGBT叠层,集电极触点,栅极触点和发射极触点。 IGBT堆叠包括注入器区域,在注入器区域上方的漂移区域,在漂移区域上方的扩展区域以及在扩展区域中的一对结注入。扩展区域提供了IGBT堆叠的第一表面,该第一表面与漂移区域相对。所述一对结注入被通道隔开,并且从所述IGBT堆叠的第一表面沿着所述IGBT堆叠的侧向边缘向所述漂移区延伸至第一深度,使得所述扩展区的厚度至少为一个。比第一深度大半倍

著录项

  • 公开/公告号WO2015160393A4

    专利类型

  • 公开/公告日2016-01-07

    原文格式PDF

  • 申请/专利权人 CREE INC.;

    申请/专利号WO2015US11015

  • 申请日2015-01-12

  • 分类号H01L29/16;H01L29/10;H01L29/739;H01L29/66;

  • 国家 WO

  • 入库时间 2022-08-21 14:20:48

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