首页> 外国专利> IGBT STRUCTURE FOR WIDE BAND-GAP SEMICONDUCTOR MATERIALS

IGBT STRUCTURE FOR WIDE BAND-GAP SEMICONDUCTOR MATERIALS

机译:宽带间隙半导体材料的IGBT结构

摘要

An IGBT device includes an IGBT stack, a collector contact, a gate contact, and an emitter contact. The IGBT stack includes an injector region, a drift region over the injector region, a spreading region over the drift region, and a pair of junction implants in the spreading region. The spreading region provides a first surface of the IGBT stack, which is opposite the drift region. The pair of junction implants is separated by a channel, and extends from the first surface of the IGBT stack along a lateral edge of the IGBT stack towards the drift region to a first depth, such that the thickness of the spreading region is at least one and a half times greater than the first depth.
机译:IGBT器件包括IGBT叠层,集电极触点,栅极接触和发射极触点。 IGBT叠层包括喷射器区域,喷射器区域上的漂移区,漂移区域上的扩散区域,以及扩散区域中的一对结植入物。 扩散区域提供IGBT叠层的第一表面,其与漂移区域相对。 一对结植入物由通道分开,并且沿着IGBT叠层的第一表面沿IGBT叠层的侧向朝向漂移区域延伸到第一深度,使得扩散区域的厚度是至少一个 半乘数大于第一深度。

著录项

  • 公开/公告号EP3117463B1

    专利类型

  • 公开/公告日2021-12-08

    原文格式PDF

  • 申请/专利权人 WOLFSPEED INC.;

    申请/专利号EP20150745260

  • 申请日2015-01-12

  • 分类号H01L29/16;H01L29/10;H01L29/739;H01L21/331;

  • 国家 EP

  • 入库时间 2022-08-24 22:42:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号