VACUUM ULTRAVIOLET LIGHT SOURCE DEVICE, LIGHT IRRADIATION DEVICE AND METHOD FOR PATTERNING SELF-ASSEMBLED MONOMOLECULAR FILM

摘要

To suppress the amount of ozone generation when vacuum ultraviolet light (VUV light) is irradiated in an atmosphere containing oxygen.A light irradiation device (100) irradiates a self-assembled monomolecular film (SAM film), which is formed on a work (W), with light containing VUV light through a mask (M) of a predetermined pattern in an atmosphere containing oxygen, thereby patterning the SAM film. The light containing VUV light irradiated on the SAM film is pulsed light and has a light emission duty ratio of from 0.00001 to 0.01 (inclusive).