METHOD FOR DETERMINING THE THICKNESS OF A THIN LAYER BY MULTI-WAVELENGTH INTERFEROMETRY AND CORRESPONDING COMPUTER PROGRAM PACKAGE, STORAGE MEANS AND SYSTEM

摘要

A method and system are provided for determining the thickness of a thin layer deposited on the surface of a reflective substrate, by means of a multi-wavelength device in a configuration equivalent to a Michelson interferometer. The method consists in: generating (20) an array of collimated light beams intended to illuminate the surface of the thin layer and that of the planar mirror, each beam having a distinct wavelength; occulting (21) the measurement arms, preventing the collimated light beams from being received by the object to be measured, and obtaining (22) a reference image representative of the light intensity issued from the planar mirror; occulting (23) the reference arm, preventing the collimated light beams from being received by the planar mirror, and obtaining (24) a measurement image representative of the light intensity issued from the object to be measured; and determining (25) the thickness of the thin layer from the measurement and reference images obtained.