首页> 外国专利> TIN (II) HALIDE-BASED PEROVSKITE FILM, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC DEVICE AND PHOTOVOLTAIC DEVICE USING SAME

TIN (II) HALIDE-BASED PEROVSKITE FILM, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC DEVICE AND PHOTOVOLTAIC DEVICE USING SAME

机译:基于卤化锡(II)的钙钛矿膜,制造相同膜的方法以及使用该钛膜的电子设备和光伏设备

摘要

In an X-ray diffraction chart of a tin (II) halide-based perovskite compound according to the present invention, the intensity ratio of a diffraction peak with the highest intensity corresponding to a tin (IV) compound present within a diffraction angle 2θ range of 10-50o inclusive to a diffraction peak of plane index (002) corresponding to the tin (II) halide-based perovskite compound is not grater than 10%.
机译:在根据本发明的卤化锡(II)基钙钛矿化合物的X射线衍射图中,强度最高的衍射峰的强度比对应于存在于衍射角2θ范围内的锡(IV)化合物。对应于基于卤化锡(II)的钙钛矿型化合物的平面指数(002)的衍射峰的10-50 o 的峰不大于10%。

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