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LASER IRRADIATION INDUCED SURFACE PLANARIZATION OF POLYCRYSTALLINE SILICON FILMS
LASER IRRADIATION INDUCED SURFACE PLANARIZATION OF POLYCRYSTALLINE SILICON FILMS
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机译:激光辐照引起的多晶硅薄膜表面平面化
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摘要
A method for planarizing excimer laser annealed (ELA) polycrystalline thin films via laser irradiation. The method includes providing an ELA thin film having an oxide and a top surface with a first surface roughness defined at least by a first plurality of protrusions. The ELA thin film is etched to substantially remove the oxide. At least a portion of the etched ELA thin film is then irradiated using a short-pulse duration excimer laser beam, to form an irradiated thin film with a second surface roughness defined at least by a second plurality of protrusions. The second surface roughness is lower than the first surface roughness.
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