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Laser irradiation induced surface planarization of polycrystalline silicon films
Laser irradiation induced surface planarization of polycrystalline silicon films
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机译:激光辐照诱导多晶硅膜的表面平坦化
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摘要
A method for planarizing excimer laser annealed (ELA) poly-crystalline thing films via irradiation. The method includes providing an ELA thin film having an oxide and a top surface with a first surface roughness defined at least by a first plurality of protrusions. The ELA thin film is etched to substantially remove the oxide. At least a portion of the etched ELA thin film is then irradiated using a short-pulse duration excimer laser beam, to form an irradiated thin film with a second surface roughness defined at least by a second plurality of protrusions. The second surface roughness is lower than the first surface roughness.
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