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ACCURATE FILM THICKNESS CONTROL IN GAP-FILL TECHNOLOGY
ACCURATE FILM THICKNESS CONTROL IN GAP-FILL TECHNOLOGY
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机译:间隙填充技术中的精确膜厚控制
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摘要
Embodiments disclosed in the present invention generally relate to processing of substrates, and more particularly, relate to methods for accurate control of film thickness using deposition-etch cycles. Particularly, embodiments of the present invention may be used in controlling film thickness during filling high aspect ratio features.;COPYRIGHT KIPO 2016
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