OPTICAL ASSEMBLY, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHOGRAPHY SYSTEM

摘要

the invention the optical assembly, in particular a plasma source (1 ') or of the EUV lithography system will, which is inside the housing space (3) surrounding the housing (2), the housing (2) in the a vacuum generating unit for generating a vacuum, one or more surfaces (13) disposed in said housing interior (3), the cleaning device 15 for removing the contaminated material (14) deposited on said surface (13), and the the surface comprises a monitoring device 25 to monitor 13, the monitoring device 25 has an optical monitoring unit 26 that can be oriented toward the surface (13). The cleaning device 15 is configured to remove CO ₂ for CO ₂ pellets (17) form the deposited contaminants 14 by discharged. ;