ETCHANT COMPOSITION FOR MOLYBDENUM ALLOY LAYER AND INDIUM OXIDE LAYER AND MANUFACTURING METHOD OF ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING ETCHANT COMPOSITION

摘要

The present invention relates to an etchant composition for a molybdenum alloy layer, an indium oxide layer, or a multilayer of the molybdenum alloy layer and the indium oxide layer; and a manufacturing method of an array substrate for a liquid crystal display device using the etchant composition. Based on the total weight of the composition, the etchant composition comprises: A) 5 to 25 wt% of hydrogen peroxide (H_2O_2); B) 0.1 to 2 wt% of a fluorine containing compound; C) 0.5 to 5 wt% of a gamma-butyrolactone derivative containing a hydroxyl group; D) 0.01 to 5 wt% of a sulfone-based compound; E) 1 to 3 wt% of an anticorrosive agent; and F) the remainder of water. The etchant composition of the present invention has excellent etching speed on a molybdenum alloy layer and an indium oxide layer without attacking a copper-based metal layer located below.;COPYRIGHT KIPO 2016