Chemical-Mechanical Polishing of CdTe and Zn_(x)Cd_(1-x)Te Single Crystals by H_(2)O_(2)(HNO_(3))-HBr-Organic Solvent Etchant Compositions

摘要

Chemical-mechanical polishing of CdTe and Zn_(x)Cd_(1-x)Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H_(2)O_(2)(HNO_(3))-HBr-solvent has been investigated. The dependences of the chemical-mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry. The polishing etchant compositions for CdTe and Zn_(x)Cd_(1-x)Te single-crystal surfaces and the chemical polishing conditions have been optimized.