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Control method for domain wall of magnetic structure and using the magnetic memory device

机译:磁性结构的畴壁的控制方法及使用该磁性存储装置的方法

摘要

the magnetization of the invention is a plurality of magnetic domains and the magnetic domain in the magnetic structure with the magnetic domain wall provided between said magnetic domains parallel to the magnetization direction of the wall in one direction by the first magnetic field and the magnetic domain wherein a first step of applying a second magnetic field in a direction parallel to the second direction; And a second step of applying a third magnetic field and the fourth magnetic field in a direction opposite to the second direction in a direction opposite to the first direction to the magnetic structure; by performing, including, the magnetic domain magnetic domain wherein the wall magnetization direction of the wall or and to uniformly move to the magnetization direction and the parallel direction of the magnetic domain wherein the plurality of magnetic domains and the magnetic structure with the magnetic domain wall provided between the magnetic domains, the magnetic domains parallel to the magnetization direction and the magnetization direction of the magnetic domain walls and each a first step of applying a non-magnetic field; Uniformly move to the magnetization direction and the parallel direction of the by performing, including, the magnetic domain magnetic domain wherein the walls of the wall magnetization direction or the magnetic domain above; and a second step of applying a further magnetic field in the reverse direction of the magnetic field direction in the magnetic structure magnetic domain wall of the magnetic structure, control method, and which can provide a magnetic memory device comprising the magnetic structure according to the control method. ;
机译:本发明的磁化是在磁性结构中的多个磁畴和磁畴,其中所述磁畴壁设置在所述磁畴之间,所述磁畴壁通过第一磁场和所述磁畴在一个方向上平行于壁的磁化方向,其中在平行于第二方向的方向上施加第二磁场的第一步;第二步,在磁性结构的与第一方向相反的方向上,在与第二方向相反的方向上施加第三磁场和第四磁场;通过执行包括以下操作的磁畴磁畴,其中壁的壁磁化方向或和均匀地移动到磁畴的磁化方向和平行方向,其中多个磁畴和具有磁畴壁的磁性结构设置在磁畴之间,平行于磁畴壁的磁化方向和磁化方向的磁畴,以及分别施加非磁场的第一步;通过执行包括壁的磁化方向或壁上方的磁畴在内的磁畴,使磁化方向和磁化方向平行。第二步骤,在该磁性结构的磁性结构的磁畴壁中,在与该磁场方向相反的方向上施加另外的磁场的控制方法,其可以提供根据该控制的包括该磁性结构的磁存储装置方法。 ;

著录项

  • 公开/公告号KR101642478B1

    专利类型

  • 公开/公告日2016-07-25

    原文格式PDF

  • 申请/专利权人 한국표준과학연구원;

    申请/专利号KR20140089300

  • 发明设计人 문경웅;황찬용;

    申请日2014-07-15

  • 分类号G11B5/02;G11C11/15;H01L27/105;

  • 国家 KR

  • 入库时间 2022-08-21 14:12:09

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