首页> 外国专利> Vacuum chamber, a method for operating a vacuum chamber and method for operating a vacuum plant 318,892 ethyl 1-cyclopropyl-7-fluoro-8-trifluoromethyl-1,4-dihydro-4-oxo-3-quinolinecarboxylate

Vacuum chamber, a method for operating a vacuum chamber and method for operating a vacuum plant 318,892 ethyl 1-cyclopropyl-7-fluoro-8-trifluoromethyl-1,4-dihydro-4-oxo-3-quinolinecarboxylate

机译:真空室,操作真空室的方法和操作真空装置的方法318,892乙基1-环丙基-7-氟-8-三氟甲基-1,4-二氢-4-氧代-3-喹啉羧酸酯

摘要

According to various embodiments may be a vacuum chamber (100) at least comprises: at least one first region (% si heritage 101p) and at least one second region (% si heritage 103p) for processing a substrate (220) in the vacuum chamber (100); a transport device for transporting the substrate (220) to be processed by at least the first region (% si heritage 101p) in the second region (% si heritage 103p); a between the first region (% si heritage 101p) and the second region (% si heritage 103p) of the parabolic channel arranged position structure (104), wherein the lane position of the parabolic reflector structure (104) a gutter para position gap (104g) between the lane position of the parabolic reflector structure (104) and the transported by means of the transport device to be processed substrate (220) forms in such a way that a propagation of gas particles of one of the two% si rich heritage (101p, 103p) by means of the gutter para position gap (104g) into the other of the two% si rich heritage (101p, 103p) is inhibited; and a between the first region (% si heritage 101p) and the second region (% si heritage 103p), which are arranged in a gas supply (104z) for introducing an inert gas (114) in the lane position gap (104g of the parabolic reflector.).
机译:根据各种实施例,可以是真空室(100),其至少包括:用于在真空室中处理衬底(220)的至少一个第一区域(%si遗产101p)和至少一个第二区域(%si遗产103p)。 (100);输送装置,其用于在第二区域(Si%残留物103p)中至少由第一区域(Si%残留物101p)输送被处理的基板(220)。抛物线形通道的位置结构(104)的第一区域(%si遗产101p)和第二区域(%si遗产103p)之间的a,其中抛物面反射器结构(104)的车道位置为沟槽的对位位置间隙( 104g)在抛物面反射器结构(104)的车道位置和借助于待处理的运输设备(220)的运输之间形成,使得富含si含量为2%的遗产之一的气体颗粒的传播(101p,103p)借助于装订线对位间隙(104g)被抑制进入富含二硅的另一遗产(101p,103p);在第一区域(%si遗产101p)和第二区域(%si遗产103p)之间设置有a,它们被布置在用于将惰性气体(114)引入车道位置间隙(104g)的气体供应(104z)中。抛物线反射器。)。

著录项

  • 公开/公告号DE102014116696A1

    专利类型

  • 公开/公告日2016-05-19

    原文格式PDF

  • 申请/专利权人 VON ARDENNE GMBH;

    申请/专利号DE201410116696

  • 发明设计人 CHRISTOPH HÄUSLER;RONNY BORCHEL;

    申请日2014-11-14

  • 分类号C23C14/56;C23C16/54;

  • 国家 DE

  • 入库时间 2022-08-21 14:09:58

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