Optical wavefront manipulator, projection objective with such an optical wavefront manipulator and microlithographic apparatus with such a projection objective

摘要

An optical wavefront manipulator having a first optical component (12, 156) defining an optical axis (16) and an outer side (18) and an inner side (20, 158) located opposite the outer side (18, 160) along the optical axis (16) a heat exchange device (43, 153, 153 ', 153 ", 153'") which faces the inside (20, 158) of the first optical component (12, 156), wherein the heat exchange device (43, 153, 153 ', 153 ", 153'") has a media inlet (36) and a media outlet (42), the media inlet (36) being adapted to supply a heat exchange medium and to pressurize the interior (20, 158) with the heat exchange medium the media outlet (42) is fluidly connected to the media inlet (36) and adapted for discharging the heat exchange medium, wherein the media inlet (36) for generating at least one particle beam (38) from the heat exchange medium, an effusive source (73) and / or e aerodynamic lens (106).