METHOD FOR MAKING NANOSTRUCTURED SURFACES USING A MICROSTRUCTURED SURFACE AND A NANOSCALE MASK

摘要

The present invention related to a continuous method for making a nanostructured surface comprising:(a) placing a substrate which comprises a microstrctured surface and a nanoscale mask on a cylindrical electrode in a vacuum vessel,(b) introducing etchant gas to the vessel at a predetermined pressure,(c) generating plasma between the cylindrical electrode and a counterelectrode,(d) rotating the cylindrical electrode to translate the substrate, and(e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.