Method for generating nanostructured and/or microstructured surfaces in an adhesive, in particular self-adhesive layer

摘要

The process for producing nanostructured and/or microstructured surfaces in a self-adhesive layer, comprises guiding an adhesive polymer mixture into a nip formed by a relief roll (10) and a nip roll (20), and blending the polymer mixture with colorants and/or fillers. A surface of the relief roll is provided with a relief (11), which represents the negative of the surface structure to be produced on the adhesive layer. The relief roll and the nip roll rotate in opposite directions. The nip roll wrapped partly around the relief roll is a web-form carrier material (40). The process for producing nanostructured and/or microstructured surfaces in a self-adhesive layer, comprises guiding an adhesive polymer mixture into a nip formed by a relief roll (10) and a nip roll (20), and blending the polymer mixture with colorants and/or fillers. A surface of the relief roll is provided with a relief (11), which represents the negative of the surface structure to be produced on the adhesive layer. The relief roll and the nip roll rotate in opposite directions. The nip roll wrapped partly around the relief roll is a web-form carrier material (40), which is guided through the nip and whose speed corresponds to the peripheral speed of the relief roll. The adhesive polymer mixture is pressed through the nip so that the near-roll surface of the polymer mixture is shaped in accordance with the relief, lies in layer form on the carrier material after passage through the nip, and is guided away with the carrier material. A feed roll forms a further nip with the nip roll. The feed roll and the nip roll rotate with the same peripheral speed. The polymer mixture is first applied to the feed roll, is guided into the further nip, and is guided into the nip between the relief roll and the nip roll while the remaining on the nip roll after passing through the nip. The rolls are heated to a temperature above the melting point of the used polymer mixture or cooled. The relief is produced by sandblasting, etching, laser ablation, lithographic techniques, offset printing, electroplating techniques, lithography-galvanic, cutting, milling and/or erosion, or the relief roll is composed of a roll with a form tool wrapped around it. The structure depth of the counter-relief produced in the self-adhesive layer is 1-3000 mu m, and the structure width is 0.5 mu m to 10 cm. The peripheral speed of the nip roll is more than 70% of the peripheral relief roll. The relief roll and the nip roll rotate with the same peripheral speed. After passage through the nip, the self-adhesive layer is taken from the carrier material and transferred to a second carrier. The carrier material is an inherently impervious strip. The polymer mixture at processing temperature is in softened or melted form. The self-adhesive composition is filled with microballoons. After structuring, the polymer (31) is subjected to cross-link by ionizing radiation. An independent claim is included for a self-adhesive coating obtained in a process.