首页> 外国专利> PROTECTIVE FILM FORMING FILM, PROTECTIVE FILM FORMING SHEET, MANUFACTURING METHOD OF WORKPIECE OR PROCESSED PRODUCT, INSPECTION METHOD, WORKPIECE DETERMINED AS ADEQUATE PRODUCT, AND PROCESSED PRODUCT DETERMINED AS ADEQUATE PRODUCT

PROTECTIVE FILM FORMING FILM, PROTECTIVE FILM FORMING SHEET, MANUFACTURING METHOD OF WORKPIECE OR PROCESSED PRODUCT, INSPECTION METHOD, WORKPIECE DETERMINED AS ADEQUATE PRODUCT, AND PROCESSED PRODUCT DETERMINED AS ADEQUATE PRODUCT

机译:保护膜成型膜,保护膜成型板,工件或加工产品的制造方法,检查方法,确定为合格产品的工件以及确定为合格产品的加工产品

摘要

PROBLEM TO BE SOLVED: To provide: a protective film forming film and a protective film forming sheet, which are attached on a rear face of a workpiece such as a semiconductor wafer, which can form a protective film on a rear face of a processed product such as a semiconductor chip, which are suitable for dividing and processing a workpiece by a modified layer destructing tensile divide during a process for obtaining a processed product after being attached on a rear face of a workpiece, and which are also suitable for performing an infrared inspection of a processed product while a protective film is attached on a rear face thereof; a method for manufacturing a workpiece or a processed product using the protective film forming film or the protective film forming sheet; an inspection method using the protective film forming film or the protective film forming sheet; and a workpiece and a processed product which are determined as an adequate product by means of the inspection method.SOLUTION: A protective film forming film contains an organic coloring agent, has a content of carbon black of 0.05 mass% or less, and has a light transmittance at a wavelength of 1,064 nm of 60% or more and a light transmittance at a wavelength of 1,250 nm of 65% or more.SELECTED DRAWING: Figure 2
机译:解决的问题:提供:保护膜形成膜和保护膜形成片,其被附着在诸如半导体晶片的工件的背面上,其可以在被加工产品的背面上形成保护膜。诸如半导体芯片之类的芯片,其适合于在附接至工件的背面之后获得加工产品的过程中通过破坏拉伸分割的改性层对工件进行分割和加工,并且还适于执行红外在加工产品的背面贴有保护膜的情况下检查加工产品;使用保护膜形成膜或保护膜形成片材制造工件或被加工物的方法;使用保护膜形成膜或保护膜形成片的检查方法;解决方案:保护膜形成膜包含有机着色剂,炭黑含量为0.05质量%以下,并且具有在1,064 nm波长处的透光率为60%或更高,在1,250 nm波长处的透光率为65%或更高。图2

著录项

  • 公开/公告号JP2017011198A

    专利类型

  • 公开/公告日2017-01-12

    原文格式PDF

  • 申请/专利权人 LINTEC CORP;

    申请/专利号JP20150127419

  • 申请日2015-06-25

  • 分类号H01L21/301;B23K26/53;H01L23/00;H01L23/29;H01L23/31;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:55

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