SYSTEM AND METHOD FOR VAPOR PHASE HYDROXYL RADICAL PROCESSING OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for processing a substrate.SOLUTION: A method includes a step of positioning a substrate in a processing chamber of a substrate processing system. The substrate includes a layer of a carbon-containing material on the working surface of the substrate. The method further includes the steps of receiving hydrogen peroxide vapor in a vapor processing region of the substrate processing system, processing the hydrogen peroxide vapor and producing hydroxyl radical vapor by processing the hydrogen peroxide vapor in the vapor processing region, and directing the hydroxyl radical vapor and remaining hydrogen peroxide vapor toward the working surface of the substrate, and modifying carbon-containing material chemically.SELECTED DRAWING: None