首页> 外国专利> Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device, and method of operating the same

Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device, and method of operating the same

机译:用于真空处理设备的基板散布装置,具有基板散布装置的真空处理装置及其操作方法

摘要

A processing apparatus for processing a flexible substrate, in particular, a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber, a processing drum within the vacuum chamber, the processing drum being configured to rotate about an axis extending in a first direction, a heating device adjacent the processing drum And a heating device configured to spread the substrate in a first direction or maintain the spread of the substrate in a first direction and wherein the dimension in a direction parallel to the substrate transfer direction is at least 20 mm .BACKGROUND OF THE INVENTION
机译:描述了用于处理柔性基板的处理设备,特别是用于处理柔性基板的真空处理设备。该处理设备包括:真空室;在真空室内的处理鼓,该处理鼓被配置为围绕在第一方向上延伸的轴线旋转;邻近该处理鼓的加热装置;以及被配置为在基板中散布基板的加热装置。第一方向或保持衬底在第一方向上的扩展,并且其中在平行于衬底传送方向的方向上的尺寸至少为20 mm。

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