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Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device, and method of operating the same
Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus with substrate spreading device, and method of operating the same
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机译:用于真空处理设备的基板散布装置,具有基板散布装置的真空处理装置及其操作方法
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摘要
A processing apparatus for processing a flexible substrate, in particular, a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber, a processing drum within the vacuum chamber, the processing drum being configured to rotate about an axis extending in a first direction, a heating device adjacent the processing drum And a heating device configured to spread the substrate in a first direction or maintain the spread of the substrate in a first direction and wherein the dimension in a direction parallel to the substrate transfer direction is at least 20 mm .BACKGROUND OF THE INVENTION
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