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Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus having substrate spreading device, and method of operating the same
Substrate spreading device for vacuum processing apparatus, vacuum processing apparatus having substrate spreading device, and method of operating the same
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机译:用于真空处理设备的基板散布装置,具有基板散布装置的真空处理装置及其操作方法
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摘要
A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.
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