CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT COMPOUND AND RESIST PATTERN FORMING PROCESS

摘要

SOLUTION: A chemically amplified negative resist composition comprises an onium salt represented by (1) or (2), a resin comprising recurring units of specific structures, and a crosslinker.EFFECT: The resist composition can control acid diffusion during exposure, exhibit a very high resolution during pattern formation, and form a pattern with reduced LER.SELECTED DRAWING: None