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Method for protecting the periphery of semiconductor wafer and manufacturing related process wafer and system during manufacturing process

机译:在制造过程中保护半导体晶片外围的方法及制造相关工艺晶片和系统

摘要

A method for processing a semiconductor wafer comprises, for example, the steps of: providing a semiconductor wafer having an active surface and a respective side surface of a wafer of semiconductor material, a plurality of semiconductor devices disposed on the active surface of the wafer, And encapsulating the exposed side surface and at least a portion of a side surface of the carrier substrate secured to the wafer with an adhesive material in the encapsulating material. At least a portion of the side surface of the adhesive material can be exposed by removing at least a portion of the encapsulating material. The carrier substrate can be removed from the wafer. A semiconductor wafer in the processing and manufacturing process of the system is also disclosed.(FIG.
机译:一种用于处理半导体晶片的方法,例如,包括以下步骤:提供具有有源表面和半导体材料的晶片的相应侧表面的半导体晶片,设置在晶片的有源表面上的多个半导体器件,并且在封装材料中用粘合材料封装固定到晶片的载体基板的暴露的侧表面和侧面的至少一部分。粘合剂材料的侧面的至少一部分可以通过去除封装材料的至少一部分而露出。可以从晶片上去除载体衬底。还公开了该系统的处理和制造过程中的半导体晶片。

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