Use of topography to induce organization of block copolymers in Graho epitaxial applications

摘要

A method of forming a patterned topography on a substrate is provided. The substrate comprises exposed features formed on the top surface, and the exposed features constitute an existing topography. A template for guided self-organization (DSA) is formed surrounding the area of the exposed topography. In addition to the method, to cover the exposed topography, the template is filled with a block copolymer (BCP). The block copolymer (BCP) is then annealed in the template to drive self-organization consistent with the topography. The step of developing the annealed BCP exposes a DSA pattern overlaying directly above the topography. In one embodiment, the surfaces of the topography or template are treated to modify their surface properties.