Mold for imprint, method for manufacturing imprint mold, method for manufacturing patterned media production substrate, and patterned media manufacturing method

摘要

PROBLEM TO BE SOLVED: To prevent problems in pattern formation which occur in manufacturing a mold for imprinting in the process of forming a silicon-containing film on a glass substrate containing alkali metal and then forming a hard mask film thereon to etch the silicon-containing film.SOLUTION: A method for manufacturing a mold for imprinting is provided, which includes: a first step of successively forming a patterning film 3, a hard mask film 4 and a resist film 5 on a glass substrate 1 containing alkali metal, and then forming a resist pattern 5a; and a second step of etching the hard mask film 4 and the patterning film 3 by using the resist pattern 5a so as to form an uneven pattern on the surface of the patterning film 4. In the first step, after the patterning film 3 is formed, the surface of the patterning film 3 is inactivated by forming an oxide film 3a by a baking treatment.