首页> 外国专利> Removal solution and removal method of oxide of group III-V element, treatment liquid of compound of group III-V element, antioxidant of III-V element, treatment liquid of semiconductor substrate and method of manufacturing semiconductor substrate product

Removal solution and removal method of oxide of group III-V element, treatment liquid of compound of group III-V element, antioxidant of III-V element, treatment liquid of semiconductor substrate and method of manufacturing semiconductor substrate product

机译:III-V族元素的氧化物的去除溶液和去除方法,III-V族元素的化合物的处理液,III-V族元素的抗氧化剂,半导体衬底的处理液和半导体衬底产品的制造方法

摘要

Removing liquid of oxide of group III-V element, antioxidant or treating solution containing an acid and a mercapto compound, a method using them, and a process for treating a semiconductor substrate containing an acid and a mercapto compound Liquid treatment liquid and method for manufacturing semiconductor substrate product using the same.
机译:去除III-V族元素的氧化物的液体,抗氧化剂或包含酸和巯基化合物的处理液,使用它们的方法以及处理包含酸和巯基化合物的半导体基板的方法液体处理液及其制造方法使用相同的半导体衬底产品。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号