Vapor deposition apparatus and control method thereof, vapor deposition method using vapor deposition apparatus, and method of manufacturing a device

摘要

A vapor deposition apparatus for co-evaporating different vapor deposition materials, comprising: a chamber in which an object to be vaporized is disposed; a first vapor deposition source for discharging vapor of a first vapor deposition material toward an object to be vaporized; A second evaporation source for ejecting vapor of the second evaporation material, a first heating portion for heating the first evaporation material, a second heating portion for heating the second evaporation material, a first heating portion and a second heating And the heating control section controls the first and second heating sections such that the temperature rise of the second vapor deposition material is started a predetermined time later than the temperature rise of the first vapor deposition material And is configured to be controllable.