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Alternatively the semiconductor substrate, method of setting the production method and the exposure conditions of the substitute semiconductor substrate
Alternatively the semiconductor substrate, method of setting the production method and the exposure conditions of the substitute semiconductor substrate
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机译:或者,半导体衬底,设定制造方法的方法和替代半导体衬底的曝光条件
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摘要
PROBLEM TO BE SOLVED: To provide a semiconductor substrate and a process of manufacturing the same, capable of reducing cost when setting an optimum exposure condition for a semiconductor substrate of low reflectance such as GaN.;SOLUTION: The semiconductor substrate having a reflectance lower than a reflectance of a silicon substrate for light of a specific wavelength includes; a silicon substrate 20; and a dielectric film 10 which is formed on the silicon substrate, and whose refractive index for light of a wavelength of 405 nm is 2.75 or higher and 3.20 or lower. The dielectric film 10 is deposited on the Si substrate 20 by using ECR sputter, for instance.;COPYRIGHT: (C)2014,JPO&INPIT
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