MULTI CHARGED PARTICLE BEAM BLANKING APPARATUS, MULTI CHARGED PARTICLE BEAM BLANKING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

摘要

A multi charged particle beam blanking apparatus includes a substrate, where a plurality of passage holes are formed, to let multi-beams of charged particle beams individually pass through a passage hole concerned; a plurality of reference electrodes, each arranged close to a corresponding passage hole, to be applied with a reference potential, not a ground potential, not via a transistor circuit, in an irradiation region of the whole multi-beams; and a plurality of switching electrodes, arranged at the substrate such that each of the plurality of switching electrodes and a corresponding paired one of the plurality of reference electrodes are opposite each other across a corresponding passage hole, to be applied with the reference potential and a control potential different from the reference potential in a switchable manner.