CHAMBER OF PLASMA SYSTEM, LINER FOR PLASMA SYSTEM AND METHOD FOR INSTALLING LINER TO PLASMA SYSTEM

摘要

A chamber of a plasma system includes a chamber wall defining a plasma processing area, a substrate supporter configured to support a substrate in the plasma processing area, and a liner located in the plasma processing area and separating the chamber wall from the plasma processing area. A liner for a plasma system and a method for installing a liner to a plasma system are also provided.