首页> 外国专利> LOW PRESSURE PLASMA CHAMBER, LOW PRESSURE PLASMA SYSTEM AND METHOD FOR PRODUCING A LOW PRESSURE PLASMA CHAMBER

LOW PRESSURE PLASMA CHAMBER, LOW PRESSURE PLASMA SYSTEM AND METHOD FOR PRODUCING A LOW PRESSURE PLASMA CHAMBER

机译:低压等离子体室,低压等离子体系统和生产低压等离子体室的方法

摘要

The invention relates to a preferably cuboid low-pressure plasma chamber body (14) made of glass. The invention further relates to a low pressure plasma chamber (12) having such a low pressure plasma chamber body (14). The low pressure plasma chamber (12) may have electrodes (16a, 16b) on opposite sides of the low pressure plasma chamber body (14). Furthermore, the low-pressure plasma chamber (12) on opposite sides have a door and a rear wall closure. The door and rear wall closure can each have at least one media connection in order to achieve a uniform gas flow in the low-pressure plasma chamber (12). The door may be mounted on its neck of the low pressure plasma chamber body (14) extending radially from the longitudinal axis of the low pressure plasma chamber body (14). The low-pressure plasma chamber body (14) is preferably made by a compression or blow-blow process, analogous to industrial glass bottle production.
机译:本发明涉及由玻璃制成的优选长方形低压等离子体室主体(14)。本发明还涉及一种具有这种低压等离子体室主体(14)的低压等离子体室(12)。低压等离子体室(12)可以在低压等离子体室主体(14)的相对侧上具有电极(16a,16b)。此外,相对侧上的低压等离子体室(12)具有门和后壁封闭件。门和后壁封闭物可以具有至少一个介质连接,以便在低压等离子体室(12)中实现均匀的气流。门可以安装在低压等离子体腔室主体(14)的颈部上,从低压等离子体室主体(14)的纵向轴线径向延伸。低压等离子体室主体(14)优选地通过压缩或吹气过程制成,类似于工业玻璃瓶生产。

著录项

  • 公开/公告号EP3531804B1

    专利类型

  • 公开/公告日2021-04-07

    原文格式PDF

  • 申请/专利权人

    申请/专利号EP20190156817

  • 发明设计人 DIENER CHRISTOF-HERBERT;

    申请日2019-02-13

  • 分类号H05H1/24;H01J37/32;

  • 国家 EP

  • 入库时间 2022-08-24 18:05:50

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