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Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems
Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems
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机译:用于提高沉积速率均匀性并减少衬底处理系统中的缺陷的系统和方法
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摘要
Systems and methods for delivering liquid precursor in a substrate processing system include supplying liquid precursor using a first valve in fluid communication with a liquid precursor source; supplying purge gas using a second valve in fluid communication with a purge gas source; arranging a third valve having a first input port in fluid communication with an output port of the first valve and a second input port in fluid communication with an output port of the second valve; arranging an input port of a first divert injector valve in fluid communication with an output port of the third valve; and operating the first valve, the second valve, the third valve and the first divert injector valve in first, second, third and fourth modes.
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