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Semiconductor-Metal-On-Insulator Structures, Methods of Forming Such Structures, and Semiconductor Devices Including Such Structures

机译:半导体绝缘体上金属结构,形成这种结构的方法以及包括这种结构的半导体器件

摘要

Methods for fabricating semiconductor-metal-on-insulator (SMOI) structures include forming an acceptor wafer including an insulator material on a first semiconductor substrate, forming a donor wafer including a conductive material and an amorphous silicon material on a second semiconductor substrate, and bonding the amorphous silicon material of the donor wafer to the insulator material of the acceptor wafer. SMOI structures formed from such methods are also disclosed, as are semiconductor devices including such SMOI structures.
机译:用于制造绝缘体上半导体金属(SMOI)结构的方法包括:在第一半导体基板上形成包括绝缘体材料的受主晶圆;在第二半导体基板上形成包括导电材料和非晶硅材料的施主晶圆;以及键合将施主晶片的非晶硅材料转变成受主晶片的绝缘体材料。还公开了通过这种方法形成的SMOI结构,以及包括这种SMOI结构的半导体器件。

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