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Radiometric test and configuration of an infrared focal plane array at wafer probe

机译:晶圆探针的红外焦平面阵列的辐射测试和配置

摘要

FPAs on a wafer can be tested prior to dicing the wafer into individual dies. A focal plane array (FPA) can comprise an array of photodetectors, such as microbolometers, on a semiconductor substrate or die. FPAs can be manufactured on a wafer to make multiple FPAs on a single wafer that can be later diced or divided into individual FPAs. Prior to dicing the wafer, the FPAs can be tested electrically and radiometrically in bulk to characterize individual FPAs, to identify bad pixels, to identify bad chips, to calibrate individual FPAs, and the like. These test results can be used to determine acceptable FPAs and can be used to provide initial settings for imaging systems with the tested and integrated FPA.
机译:在将晶片切成单个管芯之前,可以测试晶片上的FPA。焦平面阵列(FPA)可以包括在半导体衬底或管芯上的光电检测器阵列,例如微测辐射热计。可以在晶圆上制造FPA,以在单个晶圆上制造多个FPA,然后可以将其切成小块或分为单个FPA。在将晶片切成小块之前,可以对FPA进行电学和辐射测试,以表征单个FPA,识别不良像素,识别不良芯片,校准单个FPA等。这些测试结果可用于确定可接受的FPA,并可用于为具有测试和集成FPA的成像系统提供初始设置。

著录项

  • 公开/公告号US9797942B2

    专利类型

  • 公开/公告日2017-10-24

    原文格式PDF

  • 申请/专利权人 SEEK THERMAL INC.;

    申请/专利号US201514838048

  • 发明设计人 ANDREAS ENGBERG;WILLIAM J. PARRISH;

    申请日2015-08-27

  • 分类号G01R31/265;G01J1/08;G01J5/52;G01R31/28;G01J5/02;G01R31/3185;G01J5/20;G01J5/00;G01J5/06;

  • 国家 US

  • 入库时间 2022-08-21 13:46:17

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