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Plasma dry strip pretreatment to enhance ion implanted resist removal
Plasma dry strip pretreatment to enhance ion implanted resist removal
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机译:等离子干法剥离预处理可增强离子注入抗蚀剂的去除
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摘要
Systems and methods for processing a substrate include exposing a substrate to UV light from a UV light source having a predetermined wavelength range. The substrate includes a photoresist layer that has been bombarded with ions. The method includes controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature. The method includes removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature after exposing the substrate to the UV light.
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