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Nitride semiconductor structure, electronic device including the nitride semiconductor structure, light-emitting device including the nitride semiconductor structure, and method for producing the nitride semiconductor structure

机译:氮化物半导体结构,包括氮化物半导体结构的电子器件,包括氮化物半导体结构的发光器件以及用于制造氮化物半导体结构的方法

摘要

A nitride semiconductor structure includes a nitride semiconductor layer having a principal plane and including a nitride semiconductor. The normal to the principal plane of the nitride semiconductor layer is inclined at 5 degrees or more and 17 degrees or less with respect to the [11-22] axis of the nitride semiconductor constituting the nitride semiconductor layer in the direction of the +c-axis of the nitride semiconductor. The nitride semiconductor structure may further include a substrate having a principal plane which supports the nitride semiconductor layer on the principal plane. The substrate may include any one selected from the group consisting of a nitride semiconductor, sapphire, and Si.
机译:氮化物半导体结构包括具有主平面并包括氮化物半导体的氮化物半导体层。相对于构成氮化物半导体层的氮化物半导体的[11-22]轴,氮化物半导体层的主面的法线在+ c-方向上倾斜5度以上且17度以下。氮化物半导体的轴。氮化物半导体结构可以进一步包括具有主平面的基板,该主平面在主平面上支撑氮化物半导体层。基板可以包括选自由氮化物半导体,蓝宝石和Si组成的组中的任何一种。

著录项

  • 公开/公告号US9627581B2

    专利类型

  • 公开/公告日2017-04-18

    原文格式PDF

  • 申请/专利号US201514722426

  • 发明设计人 SONGBAEK CHOE;

    申请日2015-05-27

  • 分类号H01L33/32;H01L33/18;H01L33;H01L31/103;H01L33/16;H01L29/20;H01L21/02;H01S5/32;H01S5/323;

  • 国家 US

  • 入库时间 2022-08-21 13:45:15

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