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Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
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机译:阻抗匹配电路,可与千赫兹RF发生器和兆赫兹RF发生器一起操作,以控制等离子体过程
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摘要
An impedance matching circuit (IMC) is described. The impedance matching circuit includes a first circuit. The first circuit has an input coupled to a kilohertz (kHz) radio frequency (RF) generator. The IMC includes a second circuit. The second circuit has an input coupled to a low frequency megahertz (MHz) RF generator. The IMC includes a third circuit. The third circuit has an input coupled to a high frequency MHz RF generator. The IMC includes an output of the first, second, and third circuits coupled to an input of an RF transmission line. The first circuit and the second circuit provide isolation between a kHz RF signal sent through the first circuit and a low frequency MHz RF signal sent through the second circuit.
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