首页> 外国专利> Method of growing high-quality single layer graphene by using Cu/Ni multi-layer metalic catalyst, and graphene device using the same

Method of growing high-quality single layer graphene by using Cu/Ni multi-layer metalic catalyst, and graphene device using the same

机译:利用Cu / Ni多层金属催化剂生长高质量单层石墨烯的方法以及使用该方法的石墨烯器件

摘要

Disclosed are a method of growing a high-quality single layer graphene by using a Cu/Ni multi-layer metallic catalyst, and a graphene device using the same. The method controls and grows a high-quality single layer graphene by using the Cu/Ni multilayer metallic catalyst, in which a thickness of a nickel lower layer is fixed and a thickness of a copper upper layer is changed in a case where a graphene is grown by a CVD method. According to the method, it is possible to obtain a high-quality single layer graphene, and improve performance of a graphene application device by utilizing the high-quality single layer graphene and thus highly contribute to industrialization of the graphene application device.
机译:公开了一种通过使用Cu / Ni多层金属催化剂来生长高质量单层石墨烯的方法,以及使用该方法的石墨烯器件。该方法通过使用Cu / Ni多层金属催化剂控制和生长高质量的单层石墨烯,其中在石墨烯为石墨烯的情况下,镍下层的厚度是固定的,而铜上层的厚度是变化的。通过CVD方法生长。根据该方法,可以获得高质量的单层石墨烯,并通过利用高质量的单层石墨烯来提高石墨烯涂覆装置的性能,因此极大地有助于石墨烯涂覆装置的工业化。

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