SUBSTRATE PRE TREATMENT FOR CONSISTENT GRAPHENE GROWTH BY CHEMICAL DEPOSITION

摘要

The present invention relates to a process for preparing graphene comprising (i) providing in a chemical deposition chamber a substrate which has a surface S1 (ii) subjecting the substrate to a thermal pre treatment while feeding at least one gaseous or supercritical oxidant into the chemical deposition chamber so as to bring the surface S1 into contact with the at least one gaseous or supercritical oxidant and obtain a pre treated surface S2 (iii) preparing graphene on the pre treated surface S2 by chemical deposition.