METHOD FOR ANALYSING ORGANIC IMPURITIES ON THE SURFACE OF A SUBSTRATE, AND SYSTEM FOR ANALYSING ORGANIC IMPURITIES ON THE SURFACE OF A SUBSTRATE

摘要

The invention relates to a method for analysing organic impurities (3) on the surface of a substrate, including the following steps: providing a substrate comprising a first main surface; providing a polymer film (2), supported by a head associated with moving means, made of a material selected from the family of saturated aliphatic polymers, preferably without an O-H, C-O, N-H or C=O bond, and preferably from the family of semi-crystalline thermoplastics or elastomers, having a Young's modulus of less than 3 GPa; rubbing the polymer film (2) against the first main surface of the substrate with a pressure of between 104 and 105 Pa in order to recover organic impurities (3) on the first main surface; analysing the polymer film by Fourier transform infrared spectroscopy, so as to obtain a Fourier spectrum; and determining the chemical composition of the organic impurities (3) on the surface of the polymer film (2) from the comparison between the Fourier spectrum and a reference Fourier spectrum. The invention also relates to a system for analysing organic impurities (3) on the surface of a substrate.