首页> 外国专利> p-p n-n p-p ELECTRODE TYPE LIGHT EMITTING DIODE AND n-n ELECTRODE TYPE LIGHT EMITTING DIODE

p-p n-n p-p ELECTRODE TYPE LIGHT EMITTING DIODE AND n-n ELECTRODE TYPE LIGHT EMITTING DIODE

机译:p-p n-n p-p电极型发光二极管和n-n电极型发光二极管

摘要

The present invention relates to a p-p electrode type light emitting diode and an n-n electrode type light emitting diode. The p-p electrode type light emitting diode according to the present invention includes an active layer, an n-type semiconductor layer and a p-type semiconductor layer formed on both sides of the active layer, respectively; The p-type semiconductor layer is divided into a first p-type region that operates as a p-type semiconductor and a second p-type region that is broken down by a negative threshold bias; When a (+) power source is applied to the first p-type region and a negative power is applied to the second p-type region, light is emitted from the active layer region between the first p-type region and the n- . Accordingly, the etching process for exposing the n-type semiconductor layer is removed, which not only increases the process efficiency, but also can fundamentally eliminate the defect problem that may be caused in the etching process.
机译:p-p电极型发光二极管和n-n电极型发光二极管。根据本发明的p-p电极型发光二极管包括有源层,分别在该有源层的两侧上形成的n型半导体层和p型半导体层。所述p型半导体层被划分为用作p型半导体的第一p型区域和被负阈值偏压击穿的第二p型区域。当将(+)电源施加到第一p型区域并且将负功率施加到第二p型区域时,光从第一p型区域和n-之间的有源层区域发射。因此,去除了用于暴露n型半导体层的蚀刻工艺,这不仅提高了工艺效率,而且从根本上消除了在蚀刻工艺中可能引起的缺陷问题。

著录项

  • 公开/公告号KR101678763B1

    专利类型

  • 公开/公告日2016-12-06

    原文格式PDF

  • 申请/专利权人 한국산업기술대학교산학협력단;

    申请/专利号KR20150011354

  • 发明设计人 이성남;한상현;

    申请日2015-01-23

  • 分类号H01L33/36;H01L27/15;H01L33/02;H01L33/10;H01L33/20;H01L33/60;

  • 国家 KR

  • 入库时间 2022-08-21 13:28:35

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号