首页> 外国专利> ZnO Vapor-Confined Face-to-Face Annealing Method for Regrowth of ZnO nanorods

ZnO Vapor-Confined Face-to-Face Annealing Method for Regrowth of ZnO nanorods

机译:ZnO气密面对面退火法制备ZnO纳米棒

摘要

The present invention relates to a vapor-confined face-to-face annealing (VC-FTFA) method for regrowing ZnO nanorods and ZnO nanorods prepared by the method. ZnO nanorods are regrown by using the vapor-confined face-to-face annealing method according to the present invention. So, it is possible to obtain ZnO nanorods having significantly improved optical and electrical properties compared to ZnO films exposed and annealed in the air. The method includes a step of manufacturing the precursor of an ZnO layer, a step of forming a space between a first ZnO layer and a second ZnO layer, and an annealing step.
机译:本发明涉及一种用于再生长ZnO纳米棒的气相密合的面对面退火(VC-FTFA)方法以及通过该方法制备的ZnO纳米棒。 ZnO纳米棒通过使用根据本发明的蒸汽约束的面对面退火方法再生。因此,与在空气中暴露和退火的ZnO薄膜相比,可以获得具有显着改善的光学和电学性质的ZnO纳米棒。该方法包括制造ZnO层的前体的步骤,在第一ZnO层和第二ZnO层之间形成空间的步骤以及退火步骤。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号