首页> 外国专利> Magnetic tunnel junctions, methods used during formation of magnetic tunnel junctions, and methods of forming magnetic tunnel junctions

Magnetic tunnel junctions, methods used during formation of magnetic tunnel junctions, and methods of forming magnetic tunnel junctions

机译:磁性隧道结,形成磁性隧道结的过程中使用的方法以及形成磁性隧道结的方法

摘要

A method used during formation of a magnetic tunnel junction includes forming a non-magnetic tunnel insulator material over the magnetic electrode material. The tunnel insulator material includes MgO and the magnetic electrode material includes Co and Fe. B is close to opposing surfaces of the tunnel insulator material and the magnetic electrode material. A B-absorbing material is formed on the sidewalls of at least one of the magnetic electrode material and the tunnel insulator material. B is absorbed into the B-absorbing material on the side from the facing surfaces in close opposition. Other embodiments are disclosed that include magnetic tunnel junctions that are independent of the fabrication method.
机译:在磁性隧道结的形成期间使用的方法包括在磁性电极材料上方形成非磁性隧道绝缘体材料。隧道绝缘体材料包括MgO,并且磁电极材料包括Co和Fe。 B靠近隧道绝缘体材料和磁性电极材料的相对表面。在磁性电极材料和隧道绝缘体材料中的至少一个的侧壁上形成B吸收材料。 B从相对的表面紧密相对地吸收到侧面的B吸收材料中。公开了其他实施例,其包括独立于制造方法的磁性隧道结。

著录项

  • 公开/公告号KR20170107513A

    专利类型

  • 公开/公告日2017-09-25

    原文格式PDF

  • 申请/专利权人 마이크론 테크놀로지 인크;

    申请/专利号KR20177023394

  • 发明设计人 샌더 거티 에스.;

    申请日2016-02-16

  • 分类号H01L43/10;H01L43/08;H01L43/12;

  • 国家 KR

  • 入库时间 2022-08-21 13:26:36

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号