EWT MANUFACTURING METHOD OF SILICON THIN FILM FOR EMITTER WRAP-THROUGH SOLAR CELL SUBSTRATE

摘要

The purpose of the present invention is to obtain a silicon thin film for an EWT solar cell substrate, particularly, a porous silicon thin film formed up to a P-N junction by a simple process. To this end, the present invention provides a method for manufacturing a silicon thin film for an EWT solar cell substrate, which includes the steps of: forming a plurality of holes on a silicon base material; depositing a stress layer on the surface of the silicon base material; and separating the stress layer and a surface layer of the silicon base material as a thin film by the stress of the stress layer.